技术
Let’s talk about how the technical experts in our fabs can help with your lithography projects. 除了供应 材料的光刻技术, with our advanced lithographic imaging and metrology equipment, we can help with other aspects of your workflow. Services available include measurement, 缺陷检测, 流程设计, 或者提供带图案的晶圆.
Our fabs have a range of tools from g-line and i-line lithography to ArF immersion lithography, and to better support our customers and the semiconductor industry, we are now able to make these available for custom or batch tests. Tests can be done on a one-time basis or long-term as a recurring event. We also have a full suite of metrology tools that can be used in conjunction with lithographic imaging performed at our facility or on wafers imaged off-site. Our experts are also available to assist with the development of new lithographic processes and we can supply our lithography materials (such as photoresists, anti-reflective coatings and ancillaries) as part of a 流程设计 or project.
Read on to see the types of lithographic imaging and metrology tools available, as well as examples of services we can offer. Please don’t hesitate to contact us with any potential project, even if it is not listed here.
The following examples show the types of work we can do using our equipment:
These examples represent a small sampling of the types of services we can offer. Lithographic imaging and metrology are often custom designs as determined by the needs of the project, so please don’t hesitate to contact us to discuss your specific project needs.
技术 |
晶片尺寸(毫米) |
能力 |
---|---|---|
东盟地区论坛(193海里浸泡) |
300 |
外套和模式 |
ArF (193 nm干) |
200 |
外套和模式 |
KrF(248海里) |
200 |
外套和模式 |
线上(365海里) |
200 |
外套和模式 |
线上(365海里) |
100 |
大衣和洪水暴露 |
宽带 |
200 |
外套和模式 |
宽带 |
100 |
大衣和洪水暴露 |
g线路(436海里) |
100 |
外套和模式 |
计量 |
晶片尺寸(毫米) |
描述 |
---|---|---|
薄膜测量 |
100/200/300 |
光学参数 |
临界尺寸扫描 |
200/300 |
CD测量 |
缺陷 |
200/300 |
薄膜缺陷检测工具, |
扫描电子显微镜 |
所有 |
扫描电子显微镜, |
扫描电子显微镜 |
100/150/200 |
自顶向下,x射线, |
能力 |
晶片尺寸(毫米) |
工具集 |
---|---|---|
溶解速率 |
100/150 |
Single Point DRM Laser, GCA, DNS |
光密度 |
100 |
甘氨胆酸紫外- |
莳萝 |
10 |
Flood Exposure Tool, 甘氨胆酸紫外- |
你心中有一个计划吗? Imaging and metrology are often custom designs as determined by the needs of the project, requiring a high level of collaboration. Please complete the following brief form to start the conversation about your potential project needs.
We offer services such as 缺陷检测 or patterning wafers
Used in conjunction with photoresists, DuPont’s advanced overcoat materials are designed to prevent defects and improve the lithography process window, enabling finer feature patterns.
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