光刻成像服务 & 缺陷测试的计量学

Our Fabs Can Help with Your Imaging and 计量 Projects

Let’s talk about how the technical experts in our fabs can help with your lithography projects. 除了供应 材料的光刻技术, with our advanced lithographic imaging and metrology equipment, we can help with other aspects of your workflow. Services available include measurement, 缺陷检测, 流程设计, 或者提供带图案的晶圆.

Our fabs have a range of tools from g-line and i-line lithography to ArF immersion lithography, and to better support our customers and the semiconductor industry, we are now able to make these available for custom or batch tests. Tests can be done on a one-time basis or long-term as a recurring event. We also have a full suite of metrology tools that can be used in conjunction with lithographic imaging performed at our facility or on wafers imaged off-site. Our experts are also available to assist with the development of new lithographic processes and we can supply our lithography materials (such as photoresists, anti-reflective coatings and ancillaries) as part of a 流程设计 or project.

Read on to see the types of lithographic imaging and metrology tools available, as well as examples of services we can offer. Please don’t hesitate to contact us with any potential project, even if it is not listed here.

 
 
 
  • The following examples show the types of work we can do using our equipment:

    • CD测量: Measurement of CDs across features that you specify for your patterned ArF resist wafers, including data analysis and a summary report.
    • ArF成像晶片: Imaging of wafers patterned using our photoresist, 抗反射涂层, and top coat products using immersion ArF conditions.
    • 缺陷分析: Measurement, review, and defect analysis (including EDX) for your patterned wafers.
    • 过程开发: The development of a new patterning process using our resists and ancillaries, based on your design requirements. Process testing using your production wafers.
    • 材料筛选: Coating and ArF patterning evaluation of sample materials, including a summary of test results and data.

    These examples represent a small sampling of the types of services we can offer. Lithographic imaging and metrology are often custom designs as determined by the needs of the project, so please don’t hesitate to contact us to discuss your specific project needs.

  • 技术

    晶片尺寸(毫米)

    能力

    东盟地区论坛(193海里浸泡)

    300

    外套和模式

    ArF (193 nm干)

    200

    外套和模式

    KrF(248海里)

    200

    外套和模式

    线上(365海里)

    200

    外套和模式

    线上(365海里)

    100

    大衣和洪水暴露

    宽带

    200

    外套和模式

    宽带

    100

    大衣和洪水暴露

    g线路(436海里)

    100

    外套和模式

  • 计量

    晶片尺寸(毫米)

    描述

    薄膜测量

    100/200/300

    光学参数

    临界尺寸扫描
    电子显微镜(CD-SEM)

    200/300

    CD测量

    缺陷

    200/300

    薄膜缺陷检测工具,
    Patterned 缺陷 Inspection Tool,
    缺陷评估工具,
    扫描电子显微镜

    扫描电子显微镜

    所有

    扫描电子显微镜,
    横截面图像

    扫描电子显微镜

    100/150/200

    自顶向下,x射线,
    背散射,
    缺陷检查

  • 能力

    晶片尺寸(毫米)

    工具集

    溶解速率

    100/150

    Single Point DRM Laser, GCA, DNS

    光密度

    100

    甘氨胆酸紫外-

    莳萝

    10

    Flood Exposure Tool, 甘氨胆酸紫外-

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你心中有一个计划吗? Imaging and metrology are often custom designs as determined by the needs of the project, requiring a high level of collaboration. Please complete the following brief form to start the conversation about your potential project needs.

 
 
 

Lithography Materials and Services