光阻

满足历代光刻工艺要求

北京PK赛车网站提供了一种稳健的, production-proven photoresist product line with materials options that meet the requirements across generations of lithography processes from 365nm down to 13.5nm wavelengths, and exposures that achieve features from 280nm to 20nm.

The quest to achieve ever smaller technology nodes means photoresists must offer higher and better resolution with a wider depth of focus, 用更少的缺陷. At the same time, legacy nodes rely on tried and true formulations. 从我们的线上/ g线路, 到我们193个和KrF产品家族, 北京PK赛车的抗光剂可以满足你的需求.

与北京PK赛车网站的蚀刻相结合, 开发及配套产品, you get a total materials solution to support your semiconductor manufacturing processes.

Our broad portfolio also allows us to tailor photoresists to meet specific customer specifications.

线上产品

Our legacy i-Line (365nm) photoresists are formulated to support different thickness requirements while achieving high resolution and low defects. 

相关产品:

  • SPR™3光致抗蚀剂
  • SPR™700光刻胶
  • MCPR™光阻

DUV产品

Our DUV (248nm) photoresists show excellent product performances with low defects for various applications. 

  • UV™ Positive Tone Resist supports exposure and early development. It achieves high resolution to accommodate smaller pattern sizes.
  • UVN™ Negative Tone Resist, in which the exposure is developed in reverse. Scum-free, UVN™ resist is the optimal solution for deep-trench patterning.
  • SL™ Resist is our low-temperature resist that bakes at less than 100C. It features high resolution and is suitable for small pattern sizes.

史诗™光阻

史诗™光阻 are a series of 193 resists widely used for 193 processes with and without topcoats. DuPont’s EPIC™ IM Resist is designed for the unique environment created by immersion lithography, in which water between the lens and the wafer enables exposure of finer patterns.

  • Prevents resist components that leach into water from penetrating the resist film
  • 在水和抗蚀剂之间形成一个屏障层, 使屏障层不必要, 为客户节省时间和金钱
 
 
 
  • Today’s photoresists must serve a broad and wide spectrum of coverage in terms of bake temperature and exposure times. DuPont has developed a comprehensive product line to support both legacy and next-generation lithography processes.

光刻材料及服务