IC1000™CMP抛光垫

The IC1000™ series of pads for chemical mechanical planarization (CMP) is the industry standard. DuPont’s IC1000™ pads are used in a wide variety of CMP applications today. While the IC1000™ formulation has remained constant, the quality and consistency of the product offerings have been improved continuously for over 20 years. Popular pads in this family include the IC1000™ CMP pad and the IC1010™ CMP pad.

  • 好处:

    • Industry- standard hard pad for multiple applications
    • World-class quality and performance consistency

    应用程序:

    • Copper bulk, tungsten, STI/Ceria, oxide, buff

 
 
 
其他CMP应用程序

Our CMP pads cover a wide range of applications and technology nodes. To further explore DuPont CMP pads, see our overview of product families by application.